PFEIFFER Hans | IBM Microelectronics Division, Semiconductor Research and Development Center

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概要

• 同名の論文著者
• IBM Microelectronics Division, Semiconductor Research and Development Centerの論文著者

関連著者

• PFEIFFER Hans

  IBM Microelectronics Division, Semiconductor Research and Development Center

• Pfeiffer H

  Ibm Microelectronics Ny Usa

• Pfeiffer Hans

  Ibm Microelectronics Semiconductor Research And Development Center East Fishkill Facility

著作論文

• Projection Exposure with Variable Axis Immersion Lenses: A High-Throughput Electron Beam Approach to "Suboptical" Lithography
• Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL)-A High Throughput E-Beam Projection Approach for Next Generation Lithography

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