Projection Exposure with Variable Axis Immersion Lenses: A High-Throughput Electron Beam Approach to "Suboptical" Lithography
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概要
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IBM's high-throughput e-beam stepper approach PRojection Exposure with Variable Axis Immersion Lenses (PREVAIL) is reviewed. The PREVAIL concept combines technology building blocks of our probe-forming EL-3 and EL-4 systems with the exposure efficiency of pattern projection. The technology represents an extension of the shaped-beam approach toward massively parallel pixel projection. As demonstrated, the use of variable-axis lenses can provide large field coverage through reduction of off-axis aberrations which limit the performance of conventional projection systems. Subfield pattern sections containing 10^7 or more pixels can be electronically selected (mask plane), projected and positioned (wafer plane) at high speed. To generate the entire chip pattern subfields must be stitched together sequentially in a combination of electronic and mechanical positioning of mask and wafer. The PREVAIL technology promises throughput levels competitive with those of optical steppers at superior resolution. The PREVAIL project is being pursued to demonstrate the viability of the technology and to develop an e-beam alternative to "suboptical" lithography.
- 社団法人応用物理学会の論文
- 1995-12-30
著者
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Pfeiffer H
Ibm Microelectronics Ny Usa
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PFEIFFER Hans
IBM Microelectronics Division, Semiconductor Research and Development Center
関連論文
- Projection Exposure with Variable Axis Immersion Lenses: A High-Throughput Electron Beam Approach to "Suboptical" Lithography
- Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL)-A High Throughput E-Beam Projection Approach for Next Generation Lithography