Pontcharra J.de | Cea-leti
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概要
Cea-leti | 論文
- CMP-less Co-Integration of Tunable Ni-TOSI CMOS for Low Power Digital and Analog Applications
- Highly Manufacturable and Cost-effective Single Ta_xC / Hf_xZr_O_2 Gate CMOS Bulk Platform for LP Applications at the 45nm Node and Beyond
- Highly scalable and WF-tunable Ni(Pt)Si / SiON TOSI-gate CMOS devices obtained in a CMP-less integration scheme
- Effect of Process Induced Strain in 35nm FDSOI Devices with Ultra-Thin Silicon Channels
- Strained-Si for CMOS 65nm node : Si_Ge_ SRB or "Low Cost" approach?