Kamisako K | Faculty Of Technology Tokyo University Of Agricuture And Technology
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- KUROIWA Koichiの詳細を見る
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Faculty Of Technology Tokyo University Of Agricuture And Technology | 論文
- Preparation of a-Si_N_x:H Film Using N_2 Microwave Afterglow Chemical Vapor Deposition Method
- Generation Mechanism of Tensile Stress in a-Si_N_x Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- Residual Stress of a-Si_N_x:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor and Its Application to a-Si:H Deposition
- Effect of Hydrogen-Radical Annealing for SiO_2 Passivation