Masuda Y | Hachinohe Inst. Technol. Aomori Jpn
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概要
Hachinohe Inst. Technol. Aomori Jpn | 論文
- Structural and Electrical Properties of Ta_2O_5 Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source
- Effect of Annealing and Sulfur Passivation of GaAs Surface in ZnSe/GaAs Heterostructure
- Organometallic Vapor-Phase Epitaxial Growth and Characterization of GaAs/Zn(S, Se) Multilayered Structures
- Plasma-Deposited Silicon Nitride Films from SiF_2 as Silicon Source
- Plasma-Enhanced Chemical Vapor Deposition of Fluorinated Silicon Nitride