Tango Hiroyuki | Department Of Image Engineering Tokyo Polytechnic University
スポンサーリンク
概要
関連著者
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Tango Hiroyuki
Department Of Image Engineering Tokyo Polytechnic University
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Satoh Toshifumi
Department Of Image Engineering Tokyo Polytechnic University
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Yamagata Masahiro
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Nogami Yukisato
Department Of Image Engineering Tokyo Polytechnic University:(present Office)taiyo System Technology
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NOGAMI Yukisato
Department of Image Engineering, Tokyo Polytechnic University
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Hirata Seishiro
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Usami Gen
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Yamaji Toshihisa
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Satoh Toshifumi
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Yajima Toshihisa
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Tango Hiroyuki
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
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Nogami Yukisato
Department of Image Engineering, Tokyo Polytechnic University, 1583 Iiyama, Atsugi, Kanagawa 243-0297, Japan
著作論文
- Hot-Carrier Degradation in Low-Temperature Polycrystalline Silicon n-Channel Lightly Doped Drain Thin-Film Transistors
- Two-Dimensional Simulation of Electric Field and Carrier Concentration of Low-Temperature N-Channel Poly-Si LDD TFTs(Junction Formation and TFT Reliability,Fundamentals and Applications of Advanced Semiconductor Devices)
- Hot-Carrier-Induced Degradation under Current Saturation Bias in p-Channel Low-Temperature Polycrystalline Silicon Thin-Film Transistors
- Hot-Carrier Degradation and Electric Field and Electron Concentration near Drain Junction in Low-Temperature N-Channel Single Drain and Lightly Doped Drain Polycrystalline Silicon Thin Film Transistors