NOGUCHI T. | Advanced Institute of Technology
スポンサーリンク
概要
関連著者
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Kwon J.
Samsung Advanced Institute of Technology (SAIT)
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Cho H.
Samsung Advanced Institute of Technology (SAIT)
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Yin H.
Samsung Advanced Institute of Technology (SAIT)
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Xianyu W.
Samsung Advanced Institute of Technology (SAIT)
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Xianyu W.
Advanced Institute Of Technology
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Cho H.
Advanced Institute Of Technology
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KWON J.
Advanced Institute of Technology
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YIN H.
Advanced Institute of Technology
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NOGUCHI T.
Advanced Institute of Technology
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野口 隆
Samsung Advanced Institute Of Technology (sait):sungkyunkwan University (skku)
著作論文
- Excimer Laser Annealing of PbZr0.4 Ti0.6O3 Thin Film at Low Temperature for TFT FeRAM Application (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Excimer Laser Annealing of PbZr0.4 Ti0.6O3 Thin Film at Low Temperature for TFT FeRAM Application (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))