OKADA Osamu | Process Development Laboratiory, Anelva Corporation
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概要
関連著者
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SEKIGUCHI Atsushi
Process Development Laboratiory, Anelva Corporation
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OKADA Osamu
Process Development Laboratiory, Anelva Corporation
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KOBAYASHI AKIO
Department of Biotechnology, Graduate School of Engineering, Osaka University
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Kobayashi A
Process Development Laboratiory Anelva Corporation
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Okada O
Anelva Corp. Tokyo Jpn
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Kobayashi A
Department Of Biotechnology Graduate School Of Engineering Osaka University
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KOBAYASHI Akiko
Process Development Laboratiory, Anelva Corporation
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Sekiguchi A
Anelva Corp. Tokyo Jpn
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Ogi Katsumi
Materials Research Laboratories Central Research Institute Mitsubishi Materials Corporation
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Itsuki Atsushi
Materials Research Laboratories Central Research Institute Mitsubishi Materials Corporation
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KOIDE Tomoaki
Process Development Laboratiory, Anelva Corporation
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HOSOKAWA Naokichi
Process Development Laboratiory, Anelva Corporation
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ZHANG Minjuan
Process Development Laboratory, Anelva Corporation
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Koide Tomoaki
Process Development Laboratiory Anelva Corporation
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Zhang Minjuan
Process Development Laboratory Anelva Corporation
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Hosokawa Naokichi
Process Development Laboratiory Anelva Corporation
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Okada Osamu
Process Development Laboratory Anelva Corporation
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Sekiguchi Atsushi
Process Development Laboratory Anelva Corporation
著作論文
- Reaction of Copper Oxide and β-Diketone for In situ Cleaning of Metal Copper in a Copper Chemical Vapor Deposition Reactor
- Deposition Rate and Gap Filling Characteristics in Cu Chemical Vapor Deposition with Trimethylvinylsilyl Hexafluoro-acetylacetonate Copper (I)
- Chemical Vapor Deposition of Copper Thin Film Using a Novel Precursor of Allyloxytrimethylsilyl Hexafluoroacetylacetonate Copper(I) : Semiconductors