Okuwada K | Toshiba Corp. Yokohama Jpn

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概要

• OKUWADA Kumiの詳細を見る
• 同名の論文著者
• Toshiba Corp. Yokohama Jpnの論文著者

関連著者

• Okuwada K

  Toshiba Corp. Yokohama Jpn

• Imai M

  Univ. Osaka Prefecture Sakai

• Kakuno K

  Yokohama National Univ. Yokohama

• Kakuno Keiichi

  Department Of Computer Engineering Yokohama National University

• OKUWADA Kumi

  R&D Center, Toshiba Corporation

• IMAI Motomasa

  R&D Center, Toshiba Corporation

• SAITO Mami

  Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation

• OKUWADA Kumi

  Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation

• Nadahara Soichi

  Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation

• Saito Mami

  Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation

• Okuwada Kumi

  R & D Center, Toshiba Corporation

• Nakamura Shin-ichi

  R & D Center, Toshiba Corporation

• Imai Motomasa

  R & D Center, Toshiba Corporation

• NAKAMURA Shinichi

  R&D Center, Toshiba Corporation

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著作論文

• Nanoscale Investigation of Piezo and Leakage Defects in SBT Film by SPM(Special Issue on Nonvolatile Memories)
• High-Resolution Electron Microscopy on Epitaxial Pb(Mg_Nb_)O_3 Film Prepared by Sol-Gel Method
• Perovskite Formation of Pb(Mg_Nb_)O_3 and Pb(Fe_Nb_)O_3 Film by Sol-Gel Method
• Preparation of Pb(Mg_Nb_)O_3 Thin Film by Sol-Gel Method

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