MENG Xiangjian | National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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概要
- 同名の論文著者
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy oの論文著者
関連著者
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MENG Xiangjian
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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HU Zhigao
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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HUANG Zhiming
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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WANG Genshui
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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Chu Junhao
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Zhao Qiang
National Laboratory For Infrared Physics Shanghai Institute Of Technical Physics Chinese Academy Of
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Chu Junhao
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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CHU Juhhao
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy o
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Hu Zhigao
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Lin Tie
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Zhang Xiaodong
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Sun Jinglan
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Ma Jianhua
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Dho Joonghoe
Department of Physics, Kyungpook National University, Daegu 702-701, Korea
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Sun Jinglan
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Shi Fuwen
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Zhang Xiaodong
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Wang Genshui
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Zhao Qiang
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Meng Xiangjian
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Ma Jianhua
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
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Shi Fuwen
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai 200083, People's Republic of China
著作論文
- Thickness Dependence of Infrared Optical Properties of LaNiO_3 Thin Films Prepared on Platinized Silicon Substrates
- Investigations of the Optical Properties of Ba0.9Sr0.1TiO3 Ferroelectric Thin Films by Spectroscopic Ellipsometry
- Thickness Dependence of Infrared Optical Properties of LaNiO3 Thin Films Prepared on Platinized Silicon Substrates
- Low-Temperature Crystallization of PbZr0.3Ti0.7O3 Film Induced by High-Oxygen-Pressure Processing