Jang K.h | Lcd Develop. Team Ii Special Division Semiconductor Business Samsung Electronics Co. Ltd.
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概要
- JANG K. H.の詳細を見る
- 同名の論文著者
- Lcd Develop. Team Ii Special Division Semiconductor Business Samsung Electronics Co. Ltd.の論文著者
関連著者
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Jang K.h
Lcd Develop. Team Ii Special Division Semiconductor Business Samsung Electronics Co. Ltd.
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Kim Chung
MD Lab., Samsung Advanced Institute of Technology
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Kim Chung
Md Lab. Samsung Advanced Institute Of Technology
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Han M.k.
Department Of Electrical Engineering Seoul National University
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Choi J.H.
LCD Develop. Team II, Special Division, Semiconductor Business, SAMSUNG ELECTRONICS Co., Ltd.
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Kim C.W.
LCD Develop. Team II, Special Division, Semiconductor Business, SAMSUNG ELECTRONICS Co., Ltd.
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Lee J.G.
LCD Develop. Team II, Special Division, Semiconductor Business, SAMSUNG ELECTRONICS Co., Ltd.
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Choi J
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee J.g.
Lcd Develop. Team Ii Special Division Semiconductor Business Samsung Electronics Co. Ltd.
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Choi H.S.
Department of Electrical Engineering, Seoul National University, Dept. of Electrical Engineering, Se
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Jang K.H.
Department of Electrical Engineering, Seoul National University, Dept. of Electrical Engineering, Se
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Min B.H.
Department of Electrical Engineering, Seoul National University, Dept. of Electrical Engineering, Se
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Min B.h.
Department Of Electrical Engineering Seoul National University
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Choi H.s.
Department Of Electrical Engineering Seoul National University
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Jang K.H.
LCD Develop. Team II, Special Division, Semiconductor Business, SAMSUNG ELECTRONICS Co., Ltd.
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Jang K.H
LCD Develop. Team II, Special Division, Semiconductor Business, SAMSUNG ELECTRONICS Co., Ltd.
著作論文
- A Low Temperature PECVD Process of Phosphorous Doped Hydrogenated Microcrystalline Silicon Films
- A Low Temperature PECVD Process of Phosphorous Doped Hydrogenated Microcrystalline Silicon Films
- Pulsed-laser-induced crystallization of fluorinated microcrystalline silicon films with different crystalline fraction
- Pulsed-laser-induced crystallization of fluorinated microcrystalline silicon films with different crystalline fraction