Ozawa Y | Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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- OZAWA Yoshioの詳細を見る
- 同名の論文著者
- Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporationの論文著者
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation | 論文
- Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 μm MOSFETs
- Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs
- Influence of Lattice Distortion and Oxygen Defects in BST Films for Memory Capacitors
- (Ba, Sr)TiO_3 Stacked Capacitor Technology for 0.13μm-DRAMs and Beyond
- Sub-1.3 nm Amorphous Tantalum Pentoxide Gate Dielectrics for Damascene Metal Gate Transistors