Ohkubo Hiroyuki | Optoelectronic System Laboratory Hitachi Cable Ltd.
スポンサーリンク
概要
関連著者
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OKANO Hiroaki
Optoelectoronic System Laboratory, Hitachi Cable, Ltd.
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UETSUKA Hisato
Optoelectoronic System Laboratory, Hitachi Cable, Ltd.
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Ohkubo Hiroyuki
Optoelectronic System Laboratory Hitachi Cable Ltd.
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Hongo Akihito
Optoelectronic System Laboratory Hitachi Cable Ltd.
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Kashimura Seiichi
Optoelectronic System Laboratory Hitachi Cable Ltd.
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KASHIMURA Seiichi
Optoelectronic System Laboratory, Hitachi Cable, Ltd.
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Sato Shinobu
Optoelectronic System Laboratory Hitachi Cable Ltd.
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HONGO Akihito
Optoelectronic System Laboratory, Hitachi Cable, Ltd.
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OHKAWA Masahiro
Optoelectronic System Laboratory, Hitachi Cable, Ltd.
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OHIRA Kentaro
Optoelectronic System Laboratory, Hitachi Cable, Ltd.
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Okano Hiroaki
Optoelectronic System Laboratory Hitachi Cable Ltd.
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Okano Hiroaki
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Kashimura Seiichi
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Ohira Kentaro
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Ohkubo Hiroyuki
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Hongo Akihito
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Ohkawa Masahiro
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
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Sato Shinobu
Optoelectronic System Laboratory, Hitachi Cable, Ltd., 5-1-1 Hitaka-cho, Hitachi, Ibaraki 319-1414, Japan
著作論文
- Fabrication and Characterization of Non-Doped SiO2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
- Fabrication of Waveguide-Type Add/Drop Grating Filter by Radio-Frequency Magnetron Sputtering to Insert GeO_2-SiO_2 Cladding Layers
- Fabrication and Characterization of Non-Doped SiO2 Cladding Layer for Polarization-Insensitive Silica Waveguide by Using Plasma Enhanced Chemical Vapor Deposition
- Fabrication of Waveguide-Type Add/Drop Grating Filter by Radio-Frequency Magnetron Sputtering to Insert GeO2–SiO2 Cladding Layers