Takenaka Keiichi | Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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概要
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation | 論文
- Multiscale Analysis of Silicon Low-Pressure Chemical Vapor Deposition
- Fabrication of Silicon-on-Nothing Structure by Substrate Engineering Using the Empty-Space-in-Silicon Formation Technique
- Theoretical Study on the Formation Process of Empty Space in Silicon (ESS)
- Optimization of Polysilane Structure as Fast-Etching Bottom Antireflective Coating for Deep Ultraviolet Lithography
- Application of Organic Silicon Clusters to Pattern Transfer Process for Deep UV Lithography