Park Soon | Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd
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- Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltdの論文著者
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd | 論文
- Effects of Encapsulating Barrier Layer on Ferroelectric Properties of Ir/IrO_2/PZT/Pt/IrO_2 Capacitor
- Back-end Integration of Pt/BST/Pt Capacitor for ULSI DRAM Applications
- Back-end Integration of Pt/BST/Pt Capacitor for ULSI DRAM Applications
- Deposition Characteristics of (Ba, Sr)TiO_3 Thin Films by Liquid Source Metal-Organic Chemical Vapor Deposition at Low Substrate Temperatures
- Variation of Electrical Conduction Phenomena of Pt/(Ba, Sr)TiO_3/Pt Capacitors by Different Top Electrode Formation Processes