Kuwabara Shigeyuki | Isobe R&d Center Shin-etsu Handotai Co. Ltd.
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概要
Isobe R&d Center Shin-etsu Handotai Co. Ltd. | 論文
- Dominant Overall Chemical Reaction in a Chlorine Trifluoride-Silicon-Nitrogen System at Atmospheric Pressure
- Reaction of Hydrogen Fluoride Gas at High Temperatures with Silicon Oxide Film and Silicon Surface
- Transmission Electron Microscope Observation of "IR Scattering Defects" in As-Grown Czochralski Si Crystals
- Creation of Bonded SOI Substrates with CZ Silicon Higher than 1000Ωcm in Resistivity