HWU Jenn-Gwo | Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Tai
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概要
- 同名の論文著者
- Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiの論文著者
関連著者
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HWU Jenn-Gwo
Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Tai
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Hwu Jenn-gwo
Department Of Electrical Engineering And Graduate Institute Of Electronics Engineering National Taiw
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Chen Wei-ren
Department Of Electrical Engineering And Graduate Institute Of Electronics Engineering National Taiw
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JENG Ming-Jer
Department of Electronic Engineering, St. John's & St. Mary's Institute of Technology
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Jeng Ming-jer
Department Of Electronic Engineering Chang-gung University
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Jeng Ming-jer
Department Of Electrical Engineering National Taiwan University
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Lin Jing-jenn
Department Of Electrical Engineering National Taiwan University
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Hong Chao-chi
Department Of Electrical Engineering And Graduate Institute Of Electronics Engineering National Taiw
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Hwu Jenn-gwo
Graduate Institute Of Electronics Engineering / Department Of Electrical Engineering National Taiwan
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LIN Huang-Sheng
Department of Electrical Engineering, National Taiwan University
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CHANG Chia-Hua
Graduate Institute of Electronics Engineering
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Chang Chia-hua
Graduate Institute Of Electronics Engineering / Department Of Electrical Engineering National Taiwan
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Lin Huang-sheng
Department Of Electrical Engineering National Taiwan University
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HONG Chao-Chi
Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University
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CHEN Wei-Ren
Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University
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Lin Jing-Jenn
Department of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou, Taiwan 54561, R.O.C.
著作論文
- Local Thinning-Induced Oxide Nonuniformity Effect on the Tunneling Current of Ultrathin Gate Oxide(Semiconductors)
- Improvement of Oxide Leakage Currents in MOS Structures by Postirradiation Annealing
- Rapid Thermal Post-Metallization Annealing in Thin Gate Oxides
- Low Temperature Ultra-thin Hafnium Oxide Dielectrics by Sputtering of Hf Metal on Tilted Substrate Followed by Nitric Acid Oxidation then Anodization Compensation in D. I. Water