Kim J | Advanced Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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概要
- 同名の論文著者
- Advanced Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.の論文著者
Advanced Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd. | 論文
- Performance and Reliability of MIM (Metal-Insulator-Metal) Capacitors with ZrO_2 for 50nm DRAM Application
- Investigation of Chemical Vapor Deposition (CVD)-Derived Cobalt Silicidation for the Improvement of Contact Resistance
- Improvement of Contact Resistance between Ru Electrode and TiN Barrier in Ru/Crystalline-Ta_2O_5/Ru Capacitor for 50nm Dynamic Random Access Memory
- Improvement of Contact Resistance of Ru electrode/TiN barrier at Ru/Crystalline-Ta_2O_5/Ru Capacitor for 50nm DRAM device
- Investigation of CVD-Co Silicidation for the Improvement of Contact Resistance