MAA Jer-shen | Sharp Laboratories of America, Inc.
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概要
関連著者
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MAA Jer-shen
Sharp Laboratories of America, Inc.
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HSU Sheng
Sharp Laboratories of America, Inc.
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Hsu Sheng
Sharp Microelectronics Laboratory
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Hsu S
Sharp Lab. America Inc. Wa Usa
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ZHANG Fengyan
Sharp Laboratories of America, Inc.
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Kishi Akira
Process Development Center Integrated Circuits Group Sharp Corporation
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Zhang Fengyan
Sharp Laboratories Of America Inc.
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Ohnishi S
Nec Fundamental Res. Lab. Ibaraki Jpn
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Ohnishi Shigeo
Sharp Corporation
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Zhen Wendong
Sharp Corporation
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Maa J‐s
Sharp Microelectronics Lab. Washington Usa
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Maa Jer-shen
Sharp Microelectronics Technology Inc.
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Maa Jer-shen
Sharp Microelectronics Laboratory
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Ohnisi Shigeo
Osaka University Graduate School Of Engineering Department Of Material And Life Science
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DOI Tukasa
Process Development Center, Integrated Circuits Group, SHARP Corporation
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OHNISI Shigeo
Process Development Center, Integrated Circuits Group, SHARP Corporation
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AWAYA Nobuyoshi
Process Development Center, Integrated Circuits Group, SHARP Corporation
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IGUCHI Katsuji
Process Development Center, Integrated Circuits Group, SHARP Corporation
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SAKIYAMA Keizoh
Process Development Center, Integrated Circuits Group, SHARP Corporation
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Doi Tukasa
Process Development Center Integrated Circuits Group Sharp Corporation
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Ohnisi Shigeo
Process Development Center Integrated Circuits Group Sharp Corporation
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Iguchi Katsuji
Process Development Center Integrated Circuits Group Sharp Corporation
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Awaya Nobuyoshi
Process Development Center Integrated Circuits Group Sharp Corporation
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Sakiyama Keizoh
Process Development Center Integrated Circuits Group Sharp Corporation
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KISHI A.
VLSI Development Laboratories, IC Group, SHARP Corporation
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DOI T.
VLSI Development Laboratories, IC Group, SHARP Corporation
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OHNISI S.
VLSI Development Laboratories, IC Group, SHARP Corporation
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IGUTI K.
VLSI Development Laboratories, IC Group, SHARP Corporation
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SAKIYAMA K.
Process Development Center, IC Group, SHARP Corporation
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HSU S.
Sharp Microelectronics Technology, Inc.
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Iguti K.
Vlsi Development Laboratories Ic Group Sharp Corporation
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Sakiyama K.
Process Development Center Ic Group Sharp Corporation
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Ohnisi S.
Vlsi Development Laboratories Ic Group Sharp Corporation
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Kishi A.
Vlsi Development Laboratories Ic Group Sharp Corporation
著作論文
- Studies of Ir-Ta-O as High Temperature Stable Electrode Material and Its Application for Ferroelectric SrBi_2Ta_2O_9 Thin Film Deposition
- The Effect of Al Interlayer on TiSi_2 Formation
- Advanced Ti Silicide Technology with Buffer Thin Al Layer