Yang Ji-woon | Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
スポンサーリンク
概要
- YANG Ji-Woonの詳細を見る
- 同名の論文著者
- Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.の論文著者
関連著者
-
Lee Jong-wook
Silicon Systems Research Labs.
-
Lee J‐w
Technology Development Semiconductor R&d Center Samsung Electronics Co.
-
Oh Min-rok
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
-
Koh Yo-hwan
Memory R & D Division Hyundai Electronics Industries Co. Ltd.
-
Yang Ji-woon
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
-
Lee Won-chang
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
-
Lee Jong-Wook
Advanced Device Dept. 2, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
-
Yang Ji-Woon
Advanced Device Dept. 2, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
-
Lee Won-Chang
Advanced Device Dept. 2, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
-
Oh Min-Rok
Advanced Device Dept. 2, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
-
Koh Yo-Hwan
Advanced Device Dept. 2, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
-
Oh Jeong-hee
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
-
Kim Hyung-ki
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
-
Koh Yo-hwan
Semiconductor Advanced Research Division Hyundai Electronics Industries Co. Ltd
-
Lee Jong-Wook
Semicoductor Research Division, Hyundai Electronics Industries Co., Ltd.
-
Nam Myung-Hee
Semicoductor Research Division, Hyundai Electronics Industries Co., Ltd.
-
Yang Ji-Woon
Semicoductor Research Division, Hyundai Electronics Industries Co., Ltd.
-
Lee Won-Chang
Semicoductor Research Division, Hyundai Electronics Industries Co., Ltd.
-
Nam Myung-hee
Semiconductor Research Division Hyundai Electronics Industries Co. Ltd.
著作論文
- Effects of buried oxide stress on thin-film silicon-on-insulator metal-oxide-semiconductor field-effect-transistor
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR
- EVALUATION OF SOI WAFERS USING C-V CHARACTERISTICS OF THIN-FILM MOS CAPACTOR