Tamaki S | Graduate School Of Integrated Science Yokohama City University
スポンサーリンク
概要
関連著者
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Kuroda Tsukasa
Institute Of Scientific And Industrial Research Osaka University
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Tamaki Shigeru
Graduate School Of Integrated Science Yokohama City University
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Kuroda T
Waseda Univ. Tokyo Jpn
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Tamaki S
Graduate School Of Integrated Science Yokohama City University
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Tamaki Shozo
Osaka Prefectural Industrial Technology Research Institute
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Tamaki Shozo
Osaka Prefectural Industrial Research Institute
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Kuroda T
Institute Of Scientific And Industrial Research Osaka University
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Yagi Hideki
Konoshima Chemical Co. Ltd.
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Yagi H
Konoshima Chemical Co. Ltd.
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Yagyu H
Matsushita Electric Works Ltd. Osaka Jpn
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Yagi Hideichi
Institute of Scientific and Industrial Research, Osaka University
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Iwakuro Hiroaki
Research and Development Department, Shindengen Electric Manufacturing Co., Ltd.
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Yamauchi Naohiko
Osaka Prefectural Industrial Technology Research Institute
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Iwakuro H
Shindengen Electric Mfg. Co. Ltd. Saitama Jpn
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Ogasawara Toshihide
Institute of Scientific and Industrial Research, Osaka University
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Tuchida Masahiko
Institute of Scientific and Industrial Research, Osaka University
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Mori Hirotaroh
Research Center for Ultra-High Voltage Electron Microscopy, Osaka University
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IWAKURO Hiroaki
Shindengen Electric Mfg. Co., Ltd.
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TOKONAMI Masayasu
Faculty of Science, The University of Tokyo
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KITATSUJI Yasuji
Yatsushiro National College of Technology
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Mori Hirotaroh
Research Center For Ultra-high Voltage Electron Microscopy Osaka University
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Iwakuro Hiroaki
Shindengen Electric Mfg. Co. Ltd.
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YAMAUCHI Noriyoshi
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Tuchida Masahiko
Institute Of Scientific And Industrial Research Osaka University
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Ogasawara Toshihide
Institute Of Scientific And Industrial Research Osaka University
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Tokonami M
Saitama Inst. Technol. Saitama Jpn
著作論文
- Characterization of Abrasively Processed Surface of Si(100) Wafer
- Mechanism of Secondary Ion Emission from Silicon Dioxide Bombarded with Argon tons
- Interfacial Layers of High-Barrier Schottky Diode of Al/n-Type (100)Si Exposed to H_2 Plasma
- Simulation of Positive Secondary-Ion Emission from Ar+-(or O2+-) Bombarded Fe-Based Alloys by Local Thermodynamic Equilibrium Model