Makihira Kenji | Center For Microelectronic Systems Kyushu Institute Of Technology
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概要
関連著者
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Asano Tanemasa
Center For Microelectronic Systems Kyushu Institute Of Technology
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Makihira Kenji
Center For Microelectronic Systems Kyushu Institute Of Technology
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MAKIHIRA Kenji
Center for Microelectronic Systems, Kyushu Institute of Technology
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Shibata E
中華人民共和国
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Shibata Eiji
Center For Microelectronic Systems Kyushu Institute Of Technology
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Shibata Eiji
Graduate School Of Kumamoto University
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Shibata Eiji
Aichi Medical University
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Shibata Eiji
Department Of Medical Technology Faculty Of Health Sciences Nagoya University School Of Medicine
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Asano T
Kyushu Inst. Technol. Fukuoka Jpn
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Asano T
Sony Shiroishi Semiconductor Inc. Miyagi‐ken Jpn
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SASAGURI Daisuke
Center for Microelectronic Systems, Kyushu Institute of Technology
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HIGA Katsuya
Center for Microelectronic Systems, Kyushu Institute of Technology
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Higa K
Oshima National Coll. Maritime Technol. Yamaguchi Jpn
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Higa Katsuya
Center For Microelectronic Systems Kyushu Institute Of Technology
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Sasaguri Daisuke
Center For Microelectronic Systems Kyushu Institute Of Technology
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YOSHII Masahito
Center for Microelectronic Systems, Kyushu Institute of Technology
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Makihira K
Kyushu Inst. Technol. Fukuoka Jpn
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Sasaguri D
Center For Microelectronic Systems Kyushu Institute Of Technology
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TSUTAE Hiroomi
Center for Microelectronic Systems, Kyushu Institute of Technology
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Tsutae Hiroomi
Center For Microelectronic Systems Kyushu Institute Of Technology
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Asano Tanemasa
Center for Microelectronic Systems, Kyushu Institute of Technology, 680-4 Kawazu, Iizuka, Fukuoka 820-8502, Japan
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Makihira Kenji
Center for Microelectronic Systems, Kyushu Institute of Technology, 680-4 Kawazu, Iizuka, Fukuoka 820-8502, Japan
著作論文
- Field Emission from an Jon Irradiated Photoresist
- Control of Si Solid Phase Nucleation by Surface Steps for High-Performance Thin-Film Transistors
- Characteristics of Thin-Film Transistors Fabricated on Nucleation-Controlled Poly-Si Films by Surface Steps
- CMOS Application of Single-Grain Thin Film Transistor Produced Using Metal Imprint Technology