Jeong Y | Samsung Advanced Inst. Of Technol. Kyungki‐do Kor

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概要

• 同名の論文著者
• Samsung Advanced Inst. Of Technol. Kyungki‐do Korの論文著者

関連著者

• Hamada Hiroki

  Sanyo Electric Co. Ltd. Microelectronics Res. Cent.

• Hamada H

  Hitachi Ltd. Tokyo Jpn

• Hamada Hiroki

  Materials Characterization Research Laboratory Nippon Steel Corporation

• Jeong Y

  Samsung Advanced Inst. Of Technol. Kyungki‐do Kor

• Nouda T

  Sanyo Electric Co. Ltd. Gifu Jpn

• KUWANO Hiroshi

  Department of Electrical Engineering, Faculty of Science and Technology, Keio University

• Kuwano H

  Department Of Electrical Engineering Faculty Of Science And Technology Kejo Unitersity

• JEONG Yunsik

  Department of Electrical Engineering. Faculty of Science and Technology, Kejo University

• NAGASHIMA Dai

  Department of Electrical Engineering, Faculty of Science and Technology, Kejo University

• NOUDA Tomoyuki

  ANYO Electric Co., Ltd., Microelectronics Res. Cent.

• Nagashima Dai

  Department Of Electrical Engineering Faculty Of Science And Technology Kejo Unitersity

• Kuwano Hiroshi

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• Jeong Yunsik

  Department Of Electrical Engineering. Faculty Of Science And Technology Kejo Unitersity

• NOUDA Tomoyuki

  SANYO Electric Co., Ltd., Microelectronics Res. Cent.

• Nouda Tomoyuki

  Anyo Electric Co. Ltd. Microelectronics Res. Cent.

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著作論文

• Effects of Various Hydrogenation Processes on Bias-Stress-Induced Degradation in p-Channel Polysilicon Thin Film Transistors
• Mechanisms of Electrical Stress-Induced Degradation in H_2/Plasma Hydrogenated n- and p-Channel Polysilicon Thin Film Transistors

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