CHOI Gil | Semiconductor R&D Center, Samsung Electronics Co., Ltd.
スポンサーリンク
概要
関連著者
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Lee Sang
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Jeon In
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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LIM Hyun
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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CHOI Gil
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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PARK Young
Semiconductor Materials Laboratory, Nano-device Research Center, Korea Institute of Science and Tech
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Lee S
Samsung Electronics Co. Ltd. Kyungki Kor
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Lim Hwi
Photonics Research Group School Of Electrical And Electronic Engineering Nanyang Technological Unive
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Moon Jootae
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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KANG Sang
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Moon Joo
Semiconductor R&d Samsung Electronics Co. Ltd.
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Park Young
Semicondactor Materials Laboratory Korea Insrirute Of Science And Technology
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Jeon In
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Lee Sang
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Kanag Sang
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Choi Gil
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Moon Joo
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Kang Sang
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
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Lim Hyun
Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Lee, Ki heung-Eup, Yongin City, Kyungki-Do 449-900, Korea
著作論文
- Atomic Layer Deposition - and Chemical Vapor Deposition-TiN Top Electrode Optimization for the Reliability of Ta_2O_5 and Al_2O_3 Metal Insulator Silicon Capacitor for 0.13μm Technology and Beyond
- Atomic Layer Deposition- and Chemical Vapor Deposition-TiN Top Electrode Optimization for the Reliability of Ta2O5 and Al2O3 Metal Insulator Silicon Capacitor for 0.13 $\mu$m Technology and Beyond