Lee Won-jong | Department Of Materials Science And Engineering Kaist

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概要

• 同名の論文著者
• Department Of Materials Science And Engineering Kaistの論文著者

関連著者

• Lee Won-jong

  Department Of Computer Science Yonsei University

• Lee Won-jong

  Department Of Materials Science And Engineering Kaist

• LEE Won-Jong

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• Lee Hee-chul

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• SHIN Joong-Shik

  Department of Materials Science and Engineering

• Lee H‐c

  Korea Advanced Inst. Sci. And Technol. Taejeon Kor

• Chung S‐o

  Department Of Materials Science And Engineering Kaist

• Chung Su-ock

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• CHUN Soung-Soon

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• Kim Jin-woong

  Semiconductor R&d Lab.i Hyundai Electronics Co. Ltd.

• Chun Soung-soon

  Department Of Materials Science And Engineering Kaist

• Shin Joong-shik

  Department Of Materials Science And Engineering Kaist

• Jung J‐k

  Seoul National Univ. Seoul Kor

• Jung Jin-Ki

  Department of Materials Science and Engineering, KAIST, Taejeon, R. O. Korea

• Lee Hee-chul

  Department Of Materials Science And Engineering Kaist

• Jung Jin-ki

  Department Of Materials Science And Engineering Kaist

• Lee Eung-jik

  Department Of Materials Science And Engineering Kaist

• Lee Hee-chul

  Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology

• Lee Hee-Chul

  Department of Advanced Materials Engineering, Korea Polytechnic University, Siheung 429-793, Korea

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著作論文

• The Effects of Substrate Temperature and Lead Precursor Flow Rate on the Fabrication of (Pb,La)(Zr,Ti)O_3 Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition
• Effects of Electrodes on the Electric Properties of Pb(Zr, Ti)O_3 Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition
• Dry Etching Characteristics of Pb(Zr,Ti)O3 Films in CF4 and Cl2/CF4 Inductively Coupled Plasmas
• Reactive Ion Etching Mechanism of RuO2 Thin Films in Oxygen Plasma with the Addition of CF4, Cl2, and N2

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