Mheen Bongki | Basic Research Laboratory Electronics And Telecommunications Research Institute (etri)
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概要
関連著者
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Mheen Bongki
Basic Research Laboratory Electronics And Telecommunications Research Institute (etri)
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Song Young-joo
Basic Research Laboratory Electronics And Telecommunications Research Institute (etri)
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KIM Mijin
Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI)
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HONG Songcheol
Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and T
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Hong Songcheol
Department Of Electrical Engineering And Computer Science (eecs) Korea Advanced Institute Of Science
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Hong Songcheol
Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and Technology (KAIST), 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Republic of Korea
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Song Young-Joo
Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), 161 Kajeong-dong, Yuseong-gu, Daejeon 305-350, Republic of Korea
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Mheen Bongki
Basic Research Laboratory, Electronics and Telecommunications Research Institute (ETRI), 161 Kajeong-dong, Yuseong-gu, Daejeon 305-350, Republic of Korea
著作論文
- Significance of Gate Oxide Thinning below 1.5nm on 1/f Noise Behavior in n-Channel Metal-Oxide-Semiconductor Field-Effect Transistors under Electrical Stress
- Significance of Gate Oxide Thinning below 1.5 nm on $1/ f$ Noise Behavior in n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors under Electrical Stress