Yoo Hak-do | R&d Center Lg Siltron Inc.
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概要
R&d Center Lg Siltron Inc. | 論文
- Effects of Surface Roughness and Copper Contamination on the Oxide Breakdown of Silicon Wafer(Semiconductors)
- Observation of Micro-Oxygen Precipitates in the Vicinity of the Oxidation-Induced Stacking Fault Ring and Their Effects on Thin Gate Oxide Breakdown : Semiconductors
- Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection
- Gate-Oxide-Integrity Characteristics of Vacancy-rich Wafer Compared with Crystal-Orginated-Pits-free Wafer as a Function of Oxide Thickness
- Determination of Flow Pattern Defect Area by μ-Photoconductivity Decay Lifetime Measurement