Kim Seong-il | Semiconductor Materials And Devices Laboratory Korea Institute Of Science And Technology
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Semiconductor Materials And Devices Laboratory Korea Institute Of Science And Technology | 論文
- A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
- Metal Oxide Semiconductor Field Effect Transistor Characteristics with Iridium Gate Electrode on Atomic Layer Deposited ZrO_2 High-k Dielectrics
- Improvement of the Reliability of a Cu/W-N/SiOF Multilevel Interconnect by Inserting Plasma Enhanced Chemical Vapor Deposited W-N Thin Film
- Tungsten Nanodot Arrays Patterned Using Diblock Copolymer Templates
- Growth and Characterization of Triangular InGaAs/GaAs Quantum Wire Structures Grown by Low-Pressure Metalorganic Chemical Vapor Deposition