IWAMOTO H. | Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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概要
- 同名の論文著者
- Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatioの論文著者
関連著者
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IWAMOTO H.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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KADOMURA S.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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Kadomura S.
Technology Development Division Semiconductor Business Group Sony Corporation
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TAI K.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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IWAMOTO H.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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Tai K.
Technology Development Division Semiconductor Business Group Sony Corporation
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Kazi S.
Technology Development Division Semiconductor Business Group Sony Corporation
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Iwamoto H.
Technology Development Division Semiconductor Business Group Sony Corporation
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ANDO T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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HIRANO T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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TAI K.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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FUJITA S.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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WATANABE K.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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WANG J.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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TATESHITA Y.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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SAITO M.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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NAGASHIMA N.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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HIRANO T.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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TATESHITA Y.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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Tateshita Y.
Technology Development Division Semiconductor Business Group Sony Corporation
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Nagashima N.
Technology Development Division Semiconductor Business Group Sony Corporation
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SUZUKI Tatsuya
Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology
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佐藤 徳芳
東北大
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佐藤 徳芳
東北大学
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佐藤 徳芳
東北大学工学部電磁工学講座
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Suzuki Takamasa
Department Of Electronics Nagoya University:r&d Department Nippondenso Co. Ltd.
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Suzuki T
Free Electron Laser Research Institute Inc.
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Abe Hajime
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Sato N
Okayama Univ. Okayama
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Noguchi S
Department Of Physics And Electronics Osaka Prefecture University
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Sato N
Tohoku Univ.
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Sato Noriaki
Graduate School Of Science Tohoku University
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Suzuki T
Taiyo Yuden Co. Ltd. Gunma Jpn
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Suzuki T
Nhk (japan Broadcasting Corp.) Tokyo
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Sato N
Dept. Of Electronic Eng. Tohoku University
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Suzuki Tatsuro
Department Of Electrical Engineering Shizuoka University
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Sato Naoyuki
Department Of Electric And Electronic Engineering Ibazuki University
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Sato N
Kyoto Univ. Kyoto Jpn
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Sato Noriaki
Department Of Physics Tohoku University
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Suzuki Tatsuhiko
Department Of Electrical Engineering Faculty Of Engineering Science University Of Tokyo
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Suzuki Toshiharu
Sony Sc Ulsi R&d Laboratories
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Sato N
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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SATO N.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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HIYAMA S.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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NAGAOKA K.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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ABE H.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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OKUYAMA A.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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UGAJIN H.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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KATSUMATA R.
SoC R&D Center, Semiconductor Company, Toshiba Corporation
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IDEBUCHI J.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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SUZUKI T.
Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation
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HASEGAWA T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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Suzuki T
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Abe H
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Sato N
Japan Meteorological Agency Tokyo Jpn
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Idebuchi J.
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corporation
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Suzuki T
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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OSHIYAMA I.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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YAMAGUCHI S.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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TANAKA K.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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HAGIMOTO Y.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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UEMURA T.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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YAMAMOTO R.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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KANDA S.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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WAKABAYASHI H.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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TAGAWA Y.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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TSUKAMOTO M.
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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OSHIMA M.
Graduate School of Engineering, University of Tokyo
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TOYODA S.
Graduate School of Engineering, University of Tokyo
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OSHIYAMA I.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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TAGAWA Y.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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TSUKAMOTO M.
Technology Development Division, Semiconductor Business Group, Sony Corporation
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IMOTO T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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KIKUCHI Y.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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KATAOKA T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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MIYANAMI Y.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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IKEDA H.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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LANDIN T.
ASM America Inc.
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ARENA C.
ASM America Inc.
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OHNO T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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KOBAYASHI T.
Semiconductor Technology Development Group, Semiconductor Solutions Network Company, Sony Corporatio
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Suzuki T
Taiyo Yuden Co. Ltd.
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Suzuki T
Tdk Corp. Chiba Jpn
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Miyanami Y.
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Oshiyama I.
Technology Development Division Semiconductor Business Group Sony Corporation
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Ugajin H.
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Imoto T.
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Hiyama S.
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Okuyama A.
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
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Hagimoto Y.
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
著作論文
- Application of HfSiON to Deep Trench Capacitors of Sub-45nm Node Embedded DRAM
- Tinv Scaling and Jg Reducing for nMOSFET with HfSi_x/HfO_2 Gate Stack by Interfacial Layer Formation Using Ozone Water Treatment Process
- Gate Overlapped Raised Extension Structure (GORES) MOSFET by Using In-situ Doped Selective Si Epitaxy