Kim Jin | Memory Research And Development Division Hynix Semiconductor Incorporation
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概要
Memory Research And Development Division Hynix Semiconductor Incorporation | 論文
- Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process
- Physical and Electrical Characteristics of Physical Vapor-Deposited Tungsten for Bit Line Process
- Structural and Dielectric Properties of the BaTi_5O_ Thin Film Grown on the Poly-Si Substrate using RF Magnetron Sputtering
- Effects of High-Temperature Metal-Organic Chemical Vapor Deposition of Pb(Zr, Ti)O_3 Thin Films on Structural Stabilities of Hybrid Pt/IrO_2/Ir Stack and Single-Layer Ir Bottom Electrodes
- BaTi_4O_9 Thin Film Prepared by RF Magnetron Sputtering for Microwave Applications