Malic Babara | Electronic Ceramics Department, Jožef Stefan Institute
スポンサーリンク
概要
関連著者
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Ohno Tomoya
Department Of Dermatology Shimane Medical University
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Malic Babara
Electronic Ceramics Department, Jožef Stefan Institute
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Wakiya Naoki
Graduate School Of Sci. And Technol. Shizuoka Univ.
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Suzuki Hisao
Graduate School Of Sci. And Technol. Shizuoka Univ.
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Matsuda Takeshi
Department Of Cardiology School Of Medicine Kanazawa Medical University
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SUZUKI Hisao
Graduate School of Science and Technology, Shizuoka University
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Matsuda Takeshi
Department of Cardiology, Kanazawa Medical University
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Ohno Tomoya
Department Of Material Science Graduate School Of Engineering Shizuoka University
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Fukazawa Hiroaki
Graduate School of Science and Technology, Shizuoka University
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WAKIYA Naoki
Graduate School of Science and Technology, Shizuoka University
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KOSEC Marija
Graduate School of Science and Technology, Shizuoka University
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Suzuki Hisao
Graduate School Of Science And Technology Shizuoka University
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Ohno Tomoya
Department Of Materials Science And Engineering Kitami Institute Of Technology
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Wakiya Naoki
Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
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Fukuzawa Hiroaki
Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan
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Kosec Marija
Electronic Ceramics Department, Jozef Stefan Institute, 39 Jamova, Ljubljana SI-1000, Slovenia
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Kosec Marija
Electro Ceramics Department, Jožef Stefan Institute, Jamova, 39, SI-1000 Ljubljana, Slovenia
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OHNO Tomoya
Department of Materials Science, Kitami Institute of Technology
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Ohno Tomoya
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Matsuda Takeshi
Department of Materials Science, Kitami Institute of Technology
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Fukazawa Hiroaki
Graduate School of Science and Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
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Matsuda Takeshi
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
著作論文
- Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer
- Origin of Compressive Residual Stress in Alkoxide Derived PbTiO3 Thin Film on Si Wafer