Shim Kyu-hwan | Semiconductor Division Electronics And Telecommunications Research Institute
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概要
関連著者
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Shin Dong
Department Of Agricultural Chemistry The University Of Tokyo
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Shim Kyu-hwan
Semiconductor Division Electronics And Telecommunications Research Institute
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Lee Nae-eung
Department Of Materials Engineering And Center For Advanced Plasma Surface Technolog Sungkyunkwan Un
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Jang Chi
Department Of Materials Engineering And Center For Advanced Plasma Surface Technology Sungkyunkwan U
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Baik Sung
School Of Materials Science And Engineering Seoul National University
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Ban Sang
Department Of Materials Engineering And Center For Advanced Plasma Surface Technology Sungkyunkwan U
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Kim Young-woon
School Of Materials Science And Engineering Seoul National University
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Song Young-joo
Semiconductor Division Electronics And Telecommunications Research Institute
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Ahn Young
Department Of Biological Sciences Virginia Polytechnic Institute And State University
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Ahn Byung
Department Of Internal Medicine Hepatology Division Kangnam St. Mary's Hospital College Of Medi
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Ahn Byung
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon 305-701, Korea
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Ahn Young
Department of Materials Engineering and Center for Advanced Plasma Surface Technology, SungKyunKwan University, Suwon, Kyunggi-do 440-746, Korea
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Shim Kyu-Hwan
Semiconductor Division, Electronics and Telecommunications Research Institute, Taejon 305-600, Korea
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Shim Kyu-Hwan
Semiconductor Physics Research Center, Chonbuk National University, 664-14 Deokjindong, Deokjinku, Jeonju 561-756, Korea
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Baik Sung
School of Materials Science and Engineering, Seoul National University, San 56-1, Gwanak-gu, Seoul 151-742, Korea
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Song Young-Joo
Semiconductor Division, Electronics and Telecommunications Research Institute, Taejeon 305-701, Korea
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Ban Sang
Department of Materials Engineering and Center for Advanced Plasma Surface Technology, SungKyunKwan University, Suwon, Kyunggi-do 440-746, Korea
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Jang Chi
Department of Materials Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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AHN Byung
Department of Decontamination and Decommissioning, Korea Atomic Energy Research Institute
著作論文
- Formation and Properties of Epitaxial CoSi2 Layers on p-Si0.83Ge0.17/p-Si(001) using a Si Capping Layer by Metal-Organic Chemical Vapor Deposition
- Formation of Nickel Silicide Layer on Strained-Si0.83Ge0.17/Si(001) using a Sacrificial Si Layer and its Morphological Instability