Nakagawa Gou | Center For Microelectronic Systems Kyushu Institute Of Technology
スポンサーリンク
概要
関連著者
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Asano Tanemasa
Center For Microelectronic Systems Kyushu Institute Of Technology
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Nakagawa Gou
Center For Microelectronic Systems Kyushu Institute Of Technology
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Maeda Y
Deparment Of Information And Control Engineering Toyota Technological Institute
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ARIMA Yutaka
Center for Microelectronic Systems, Kyushu Institute of Technology
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Maeda Y
Center For Microelectronic Systems Kyushu Institute Of Technology
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Arima Yutaka
Department Of Neural Amp Parallel Processing Technology Advanced Technology Rampd Center Mitsubishi
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Arima Yutaka
Center For Microelectronic System Kyushu Institute Of Technology
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MAEDA Yasuhiro
Center for Microelectronic Systems, Kyushu Institute of Technology
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Maeda Yukio
Department Of Applied Physics Tokyo University Of Agriculture And Technology
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Miyasaka Mitsutoshi
Advanced Product Development Center, Seiko Epson Corporation, 281 Fujimi, Suwa, Nagano 399-0293, Japan
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SHIBATA Noritoshi
Center for Microelectronic Systems, Kyushu Institute of Technology
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Asano Tanemasa
Kyushu Univ. Fukuoka Jpn
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Miyasaka Mitsutoshi
Advanced Product Development Department
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Shibata Noritoshi
Center For Microelectronic Systems Kyushu Institute Of Technology
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Stoemenos John
Department of Physics, Aristotle University of Thessaloniki, 54124 Thessaloniki, Greece
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Higashi Naoyuki
Center for Microelectronic Systems, Kyushu Institute of Technology, 680-4, Kawazu, Iizuka, Fukuoka 820-8502, Japan
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Nakagawa Gou
Center for Microelectronic Systems, Kyushu Institute of Technology, 680-4 Kawazu, Iizuka, Fukuoka 820-8502, Japan
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Nakagawa Gou
Center for Microelectronic Systems, Kyushu Institute of Technology, 680-4, Kawazu, Iizuka, Fukuoka 820-8502, Japan
著作論文
- Effects of Electric Field on Metal-Induced Lateral Crystallization under Limited Ni-Supply Condition(Thin Film Transistors, Fundamental and Application of Advanced Semiconductor Devices)
- Physical Random-Number Generator Using Schottky MOSFET
- Physical Random-Number Generator Using Schottky MOSFET
- Location and Orientation Control of Si Grain by Combining Metal-Induced Lateral Crystallization and Excimer Laser Annealing
- Location Control of Si Thin-Film Grain Using Ni Imprint and Excimer Laser Annealing