Maki Y. | Central Research Laboratory Hitachi Ltd.
スポンサーリンク
概要
関連著者
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Maki Y.
Central Research Laboratory Hitachi Ltd.
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IWAMATSU T.
Renesas Technology Corp.
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IPPOSHI T.
Process Technology Development Div. Renesas Technology Crop.
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Ipposhi T.
Central Research Laboratory Hitachi Ltd.
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Ishigaki T.
Central Research Laboratory Hitachi Ltd.
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Iwamatsu T.
Ulsi Laboratory Mitsubishi Electric Corporation
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Hiramoto T.
Institute of Industrial Science
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ISHIGAKI T.
Central Research Laboratory, Hitachi, Ltd.
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TSUCHIYA R.
Central Research Laboratory, Hitachi, Ltd.
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MORITA Y.
Central Research Laboratory, Hitachi, Ltd.
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SUGII N.
Central Research Laboratory, Hitachi, Ltd.
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KIMURA S.
Central Research Laboratory, Hitachi, Ltd.
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IPPOSHI T.
Renesas Technology Corp.
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INOUE Y.
Renesas Technology Corp.
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MAKI Y.
Process Technology Development Div. Renesas Technology Crop.
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HIRANO Y.
Process Technology Development Div. Renesas Technology Crop.
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TSUJIUCHI M.
Process Technology Development Div. Renesas Technology Crop.
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IWAMATSU T.
Process Technology Development Div. Renesas Technology Crop.
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OZAWA O.
SoC Design Technology Div. Renesas Technology Corp.
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INOUE Y.
Process Technology Development Div. Renesas Technology Crop.
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Sugii N.
Central Research Laboratory Hitachi Ltd.
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Hiramoto T.
Institute Of Industrial Science Univ. Of Tokyo
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Tsuchiya R.
Central Research Laboratory Hitachi Ltd.
著作論文
- Wide-Range V_ Controllable SOTB (Silicon on Thin BOX) Integrated with Bulk CMOS Featuring Fully Silicided NiSi Gate Electrode
- Improvement of Device Characteristics Variation by using a Body-Bias Controlling Technology Based on a Hybrid Trench Isolated SOI