Park J | Hanyang Univ. Kyunggido Kor
スポンサーリンク
概要
Hanyang Univ. Kyunggido Kor | 論文
- Low Temperature (≤550℃) Fabrication of CMOS TFT's on Rapid-Thermal CVD Polycrystalline Silicon-Germanium Films
- Low Temperature(≦550℃) CMOS Thin-Film Transistors in RTCVD Poly-Si_Ge_ Films
- Effects of Segregated Ge on Electrical Properties of SiO_2/SiGe Interface
- Process Technology for Next Generation Photomask
- Degradation of Ta_2O_5 Gate Dielectric by TiCl_4-Based Chemically Vapor Deposited TiN Film in W/TiN/Ta_2O_5/Si System