Osborne Ian | Electrotechnical Laboratory
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概要
関連著者
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MATSUDA Akihisa
Electrotechnical Laboratory
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Osborne Ian
Electrotechnical Laboratory
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Hata N
Electrotechnical Lab. Ibaraki Jpn
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Hata Nobuhiro
Electrotechnical Laboratory
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Matsuda A
Department Of Electrical And Electronic Engineering Faculty Of Engineering Toyama University
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Ganguly G
Electrotechnical Lab. Ibaraki Jpn
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Ganguly Gautam
Electrotechnical Laboratory
著作論文
- Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon from Dichlorosilane and Silane Gas Mixtures
- Annealing Energy Distribution of Light-Induced Defects of Hydrogenated Amorphous Silicon Films Grown from Silane and Dichlorosilane Gas Mixtures
- Comparison of Defect Annealing Kinetics of a-Si:H Prepared by Pure Silane and Helium Diluted Silane by Triode Plasma Chemical Vapour Deposition
- The Effect of Mesh Bias and Substrate Bias on the Properties of a-Si:H Deposited by Triode Plasma Chemical Vapour Deposition