Yokoyama Haruki | Department of Electrical Engineering Hiroshima University

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• 同名の論文著者
• Department of Electrical Engineering Hiroshima Universityの論文著者

Department of Electrical Engineering Hiroshima University | 論文

• Substitutional Doping of a-Si_xN_ : H : III-1: AMORPHOUS FILMS
• Wide Optical-Gap, Photoconductive a-Si_xN_: H
• Nucleation of Microcrystallites in Phosphorus-Doped Si: H Films
• A New Technique of Boron Doping in Si:H Films
• Band Offset in Boron-Doped Amorphous Silicon Heterostructures : Electrical Properties of Condensed Matter

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