Kim Ryoung-Han | Advanced Micro Devices
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概要
Advanced Micro Devices | 論文
- Time Dependence of Phosphorus Diffusion and Dose Loss during Postimplantation Annealing at Low Temperatures
- Highly Reliable Ultra Thin Gate Dielectrics for Dual-Gate CMOS Devices
- Opportunities for the Application of Fracture Mechanics in Microelectronic Packaging