Katsuki Tsutomu | Department of Chemistry, Kyushu University 33

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Department of Chemistry, Kyushu University 33 | 論文

• Use of 1,8-diazabicyclo(5.4.0)undec-7-ene in preparation of trimethylsilyl enol ethers and trimethylsilylacetylenes.
• Formation of Ultra-Shallow and Low-Reverse-Bias-Current Tantalum-Silicided Junctions Using a Si-Eneapsulated Silicidation Technique and Low-Temperature Furnace Annealing below 550℃
• Formation of Ultra-Shallow, Low-Leakage and Low-Contact-Resistance Junctions by Low-Temperature Si-Encapsulated Silicidation Process
• Formation of Ultra-Shallow and Low-Reverse-Bias-Current Tantalum-Silicided Junctions Using a Si-Encapsulated Silicidation Technique and Low-Temperature Furnace Annealing below 550°C

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