Yoshikawa Hiroki | Department of Chemistry, Sophia University, Tokyo 102-8554, Japan

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Department of Chemistry, Sophia University, Tokyo 102-8554, Japan | 論文

• Electrical Properties of (Ca,Sr)Bi4Ti4O15 Thin Films Fabricated Using a Chemical Solution Deposition Method
• Charge-Compensative Ion Substitution of La3+-Substituted Bismuth Titanate Thin Films for Enhancement of Remanent Polarization
• Structural and Electrical Properties of Polycrystalline Bi4-xNdxTi3O12 Ferroelectric Thin Films with in-Plane $c$-Axis Orientations
• Ion Modification for Improvement of Insulating and Ferroelectric Properties of BiFeO3 Thin Films Fabricated by Chemical Solution Deposition

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