Liang Mong-Song | Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park
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Taiwan Semiconductor Manufacturing Company, Science-Based Industrial Park | 論文
- Annealing Effect on Boron High-Energy-Ion-Implantation-Induced Defects in Si
- Strain Efficiency Enhancement with Stress Intermedium Engineering (SIE) for Sub-65nm CMOS Scaling
- NBT Stress Induced Anomalous Drain Current Instability in HfSiON pMOSFETs Arising from Bipolar Charge Trapping