Liu J. | Chartered Semiconductor Manufacturing Ltd.
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概要
Chartered Semiconductor Manufacturing Ltd. | 論文
- Characterization of Si(100) Surface after High Density HBr/Cl_2/O_2 Plasma Etching
- Power-LaW Dependence of Charge Trapping on Injected Charge in Very Thin SiO_2 Films : Semiconductors
- Post-Stress Interface-Trap Generation in P-Channel Metal-Oxide-Semiconductor Field-Effect-Transistors after Hot-Electron Stress
- Post-Stress Interface-Trap Generation in P-Channel Metal-Oxide-Semicondutor Field-Effect-Transistors after Hot-Electron Stress