Fujimoto Takashi | Department of Chemical Engineering, Faculty of Engineering, Hiroshima University
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- Department of Chemical Engineering, Faculty of Engineering, Hiroshima Universityの論文著者
Department of Chemical Engineering, Faculty of Engineering, Hiroshima University | 論文
- Numerical Simulations of Films Formed by Cluster/Particle Co-Deposition in Atmospheric-Pressure Chemical Vapor Deposition Process Using Organic SIlicon Vapors and Ozones Gas
- Morphology Control of Films Formed by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethylorthosilicate/Ozone System
- Film Formation by a New Chemical Vapor Deposition Process Using Ionization of Tetraethylorthosilicate
- Ultra Thin Film Growth of Pd by Radical Enhanced Vapor Deposition
- Potential of Surface-Discharge Microplasma Device as Ion Source for High Efficiency Electrical Charging of Nanoparticles