Mori Akira | Research Institute of Electrical Communication, Tohoku University, Sendai 980
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Research Institute of Electrical Communication, Tohoku University, Sendai 980 | 論文
- Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (I)—Optimization of the HF Treatment—
- Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (II)—in situ UVOC
- Photon-Stimulated Desorption of H+ Ions from Oxidized Si(111) Surfaces
- Effect of Potentiostatic Control on in situ STM Images of Ag and Au Electrodes in a 0.1 M KCl Solution
- Thermoanalytical Studies on Preparation Conditions of Superconducting YBa2Cu3O7-y