TANAKA Hitoshi | FUJITSU LABORATOIRES Ltd.
スポンサーリンク
概要
FUJITSU LABORATOIRES Ltd. | 論文
- Ultra High Density HfO2-Nanodot Memory for Flash Memory Scaling
- Ultrahigh-Density HfO2 Nanodots for Flash Memory Scaling
- Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded Dynamic Random Access Memories
- Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded DRAMs
- Highly Reliable Dynamic Random Access Memory Technology for Application Specific Memory with Dual Nitrogen Concentration Gate Oxynitrides Using Selective Nitrogen Implantation