Matsumoto Akira | Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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- Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japanの論文著者
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan | 論文
- Electromigration Lifetime Enhancement of CoWP Capped Cu Interconnects by Thermal Treatment
- Degradation of Electromigration Lifetime of Cu/Low-$k$ Interconnects by Postannealing
- Time-Dependent Dielectric Breakdown Characterization of 90- and 65-nm-Node Cu/SiOC Interconnects with Via Plugs