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The Society of Photopolymer Science and Technology (SPST) | 論文
- Simulation and Correction of Angular Defects in Two-Photon Lithography
- Development of Polymer Blend Solar Cells Composed of Conjugated Donor and Acceptor Polymers
- Benzothiadiazole-Triphenylamine Derivatives as Donor Materials for Bulk-Heterojunction Organic Solar Cells
- Atmosphere Dependability of Physical Properties of Novolak Resist during Heat-Curing Process for GMR Head
- Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
- Spin-relaxation Process of Excited Triplet States of Ir(ppy)3
- Light Emitting Materials for Organic Electronics
- A Physics-based Model for Negative Tone Development Materials
- Leveraging Resist Chemistry Research for Water Purification Membrane Technology
- Three-dimensional Recording by Femtosecond Pulses in Polymer Materials
- Current Status and Future Direction of EUV Resists
- The Design of Photosensitive Polyimide Materials for Buffer Coating Processes
- Step and Flash Imprint Lithography Modeling and Process Development
- Resist Removal by using Wet Ozone
- Semitransparent Gold-Meshed Electrode Fabricated by Transfer Printing Using Self-Organized Microporous Polymer Mold
- Preparation of Polyimide Gas Separation Membrane Made by Ion Implantation Treatment
- The Photopolymer Science and Technology Award
- Polymer Brushes as Functional, Patterned Surfaces for Nanobiotechnology
- Nanoscale Characterization in Resist Processing by using Atomic Force Microscope
- Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory