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The Conference of Photopolymer Science and Technology | 論文
- Photopolymerization using Photolatent Amine Catalysts
- Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin : Application to Novel Resin Mold for UV Imprint
- Removal of polymer for nano-imprint lithography using atomic hydrogen generated by the hot-wire catalyzer
- Electrical Conduction of Organic Light-Emitting Diodes Using Self-Assembled Monolayer-Modified Indium Tin Oxide Electrode
- Influence of Additives on the Imidization of Poly(amide acid)
- The Physics of EUV Photoresist and How It Drives Strategies for Improvement
- Physical and Photochemical Properties of Macrocyclic Azobenzenes
- Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) Derivatives with Pendant Alkoxyl and Adamantyl Ester Groups
- A Resolution Enhancement Material for 193-nm Lithography Comprising 2-Hydroxybenzyl Alcohol and Poly(vinyl alcohol) with Uniform Resist Pattern Shrinkage
- Application of Graphene to Photosensitive Diazo/PVA Resist
- Synthesis of Photobase Generators Based on Proazaphosphatrane : Tetraarylborate Complex for i-Line Photopatterning
- Removal of Ion-implanted Resists using High Concentration Wet Ozone
- Analysis of the Generating Action of the Acid from PAG using Acid Sensitive Dyes (2)
- Evaluation on Fluidity of the Self-Assembled Phospholipid Layer Fabricated by Plasma-Assisted Method and its Application
- Photovoltaic Properties and Charge Dynamics in Nanophase-Separated F8T2/PCBM Blend Films
- Surface modification of ceramic nanophosphors by atmospheric pressure plasma
- Selective Area Morphology Control of Self-Assembled Patterns using Silsesquioxane-containing Block Copolymers
- Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer
- EUV Resists : Illuminating the Challenges
- Theoretical Study of Ionization of Polymers for EUV Resist