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Technical Association of Photopolymers, Japan | 論文
- Surface Functionalization of Polymers under Cold Plasma Conditions-A Mechanistic Approach
- Polymer waveguide optical amplifier using organic/inorganic nanocomposites doped with rare-earth-metal nanoclusters
- Study on the material design for LWR improvement
- 157nm Lithography-Window of Opportunity
- Design of faster high resolution resists: getting more acid yield from EUV photons
- Advances in Resist Materials for 193 nm Lithography
- Block Copolymers as Lithographic Materials
- Lithographic Techniques for the Fabrication of Oligonucleotide Arrays
- Nanoscale Characterization in Resist Processing by using Atomic Force Microscope
- Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope(AFM)
- Topcoat Characterization for Immersion Lithography by Fluoric Acid Etching on Silicon Substrate
- Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists
- Undoping Type of Highly Efficient Organic Light Emitting Diodes
- Surface Modification of Pigments with Temperature-Responsive Polymer Grafted by Plasma-Induced Polymerization
- Photocuring Systems Using Quaternary Ammonium Thiocyanates
- Development of materials and processes for double patterning toward 32 nm node ArF immersion lithography
- The Origin of Coloration in Aromatic Polyimides--An Approach from Quantum Chemistry
- Development of Photosensitive Organic-Inorganic Hybrid Materials with High Resolution for Optical Splitters
- Recent Progress on Polymer Waveguide Materials
- Chemically Amplified Si-contained Resist for Bi-layer Resist Process