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Technical Association of Photopolymers, Japan | 論文
- Fluoroalcohol-Methacrylate Resists for 193 nm Lithography
- Design Considerations for Anti-reflection Layer in Thin Imaging System
- Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology
- Flame retardant polyimidepolysiloxane-based solder resist
- An organic radical light-emitting diode based on the fluorescence emission of a trimethylenemethane biradical
- Photochemical Surface Modification of Polyacrolein Particles by Gaseous Tetramethylcyclotetrasiloxane
- Resists and Other Critical Issues in 157-nm Lithography
- Characteristics of ArF Immersion Lithography Using Topcoat
- Design consideration for immersion 193: embedded barrier layer and pattern collapse margin
- Properties and Application of Conducting Polymer on Electron-Beam Lithography
- Trends in patterning materials for advanced lithography
- 3 Dimensional Silicon Micromachining Using a Scanning Microplasma Jet Source
- Hydrophilic Patterning of Polymer Surfaces Using a Scanning Microplasma Jet Source
- Is There Any Possibility That Plasma Could Selectively Modify Polymer Surfaces?
- Preparation and Characterization of Organic Electroluminescent Devices Using Fluorescent Polyimides as a Light-Emitting Layer
- New Developments in High-Performance Resist Materials
- Dependence of the deposition rate on probe-substrate separation in nonadiabatic near-field optical CVD
- Non-ionic photoacid generators sensitive to 365nm light: synthesis and applications to photocrosslinking systems
- Analysis on deterioration mechanism of release layer in nanoimprint process
- Improvement of Defect Issues for Advanced 193nm Resist